신소재및 재료과학
플라즈마 표면 공정
플라즈마 공정에 의한 박막재료의 합성연구
플랙시블 전도막, 그린 에너지, 생명의학과 나노재료, 의학과 농업
플라즈마 소스 디자인, 제작 및 플라즈마 진단
학력
고려대학교 금속공학 학사, 1975년
고려대학교 금속공학 석사, 1978년
미국 Georgia Inst. of Technology 공학박사, 1985년
약력/경력
1987 ~ 2006 현 성균관대학교 조교수/부교수/교수
2000 ~2006 현 플라즈마응용표면기술연구센터(ERC) 소장
2006 ~ 2006 현 한국표면공학회장
1998 ~ 2006 국제 IUVSTA (International Union for Vacuum Science,
Technique and Application), 표면공학분과 한국대표위원
2004 ~ 2006 현 한국공학교육학회 이사
2005 ~ 2006 현 중국칭화대학 플라즈마공학 자문위원
학술지 논문
(2019)
Study on the electrical, optical, structural, and morphological properties of highly transparent and conductive AZO thin films prepared near room temperature.
APPLIED SURFACE SCIENCE.
473,
(2019)
Study of plasma characteristic and properties of flexible ultra-thin ITO films prepared by large area 3-D confined and planar magnetron sputtering.
VACUUM.
165,
7
(2019)
Effect of the RF power on the characteristic properties of high-performance
silicon nitride single-layer permeation barriers.
SURFACE & COATINGS TECHNOLOGY.
2019,
364
(2019)
Comparison of plasma properties in normal and multiple holes hollow cathode RF PECVD and their utility in a-SiNx:H thin film deposition.
VACUUM.
160,
(2018)
Instabilities and Plasma Flares in Moderate-Current Confined Magnetron Sputtering in Three Dimensions.
PHYSICAL REVIEW APPLIED.
10,
5
(2018)
Factors affecting the properties of highly conductive flexible ultrathin ITO films in confined large area magnetron sputtering in three dimensions.
AIP ADVANCES.
8,
10
(2018)
Plasma etched carbon microelectrode arrays for bioelectrical measurements.
DIAMOND AND RELATED MATERIALS.
2018,
90
(2018)
Plasma-enhanced reactive linear sputtering source for formation of silicon-based thin films.
REVIEW OF SCIENTIFIC INSTRUMENTS.
89,
8
(2018)
Thermoelectric Power Factor Enhancement by Pulsed Plasma Engineering in Magnetron Sputtering Induced Ge2Sb2Te5 Thin Films.
ACS APPLIED ENERGY MATERIALS.
2018,
1
(2018)
Approach for the optimization of characteristic properties of very high conductive ITO thin films using advanced magnetron plasma process.
MATERIALS RESEARCH EXPRESS.
5,
6
(2018)
Microstructural control by substrate heating in Pulse-DC sputtering induced thermoelectric Ge2Sb2Te5 thin films.
JOURNAL OF ALLOYS AND COMPOUNDS.
763,
(2018)
Effect of inductively coupled plasma and plasma parameters on magnetron sputtered Al-Doped ZnO highly conductive thin films at low-temperature.
JOURNAL OF APPLIED PHYSICS.
123,
20
(2018)
Direct synthesis of magnetron sputtered nanostructured Cu films with desired properties via plasma chemistry for their efficient antibacterial application.
PLASMA PROCESSES AND POLYMERS.
15,
9
(2018)
Multi c-BN Coatings by r.f Diode Sputtering and Investigation of Wear Behavior.
JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY.
18,
3
(2018)
Highly conductive flexible ultra thin ITO nanoclusters prepared by 3-D confined magnetron sputtering at a low temperature.
SCRIPTA MATERIALIA.
149,
(2018)
Effectiveness of plasma and radical control for the low temperature synthesis and properties of a-SiNx:H films using RF-near microwave PECVD.
PHYSICS OF PLASMAS.
25,
2
(2018)
Development and utility of a new 3-D magnetron source for high rate deposition of highly conductive ITO thin films near room temperature.
PHYSICAL CHEMISTRY CHEMICAL PHYSICS.
20,
7
(2017)
Development and plasma characterization of an 850 MHz surface-wave plasma source.
AIP ADVANCES.
7,
10
(2017)
Mechanical and structure properties of multilayer c-BN coatings on cemented carbide cutting tools.
INTERNATIONAL JOURNAL OF REFRACTORY METALS & HARD MATERIALS.
65,
(2017)
Systematic study of interdependent relationship on gold nanorod synthesis assisted by electron microscopy image analysis.
NANOSCALE.
9,
21
특허/프로그램
세포 배양용 전도성 탄소 필름, 및 이를 이용하는 세포 배양 방법.
10-2016-0044160.
20170428.
대한민국
대향 타겟식 스퍼터링 장치.
10-2015-0033212.
20161209.
대한민국
안티 박테리아성 박막의 제조 방법.
10-2015-0087297.
20160817.
대한민국
박테리아 방지용 소수성 박막 및 이의 제조 방법.
10-2015-0087296.
20160707.
대한민국
플라즈마 기판 처리 장치 및 방법.
10-2011-0004040.
20150611.
대한민국
FUNCTIONAL THIN FILM FOR TOUCH SCREEN AND METHOD FOR FORMING THE SAME.
14/553,078.
20150319.
미국
전도성 탄소계 나노구조 코팅장치 및 방법.
10-0686318-0000.
20070215.
대한민국
연성회로기판의 제조방법.
10-0675600-0000.
20070113.
대한민국
연성회로기판의 제조방법.
10-0642201-0000.
20061027.
대한민국
원형마그네트론 스퍼터링 장치.
10-0559246-0000.
20060303.
대한민국
Planar-type Magnetron Sputtering Apparatus.
HP1083-JP.
20040924.
일본
텅스텐 탄화물-티타늄 질화물 초격자 코팅막과 그의 제조 장치 및 방법.
0347422.
20020723.
대한민국
텅스텐 탄화물-티타늄 알루미늄 질화물 초격자 코팅막과 그의 제조 장치 및 방법.
0345923.
20020712.
대한민국
평판 마그네트론 스퍼터링 장치.
0345924.
20020712.
대한민국
평판 마그네트론 스퍼터링 장치.
0344188.
20020702.
대한민국
고속 전도성 세라믹/금속 복합재료 코팅방법.
0329630.
20020311.
대한민국
음극아크 방전을 이용한 대면적 평판 코팅장치.
0329632.
20020311.
대한민국
초고속 펄스-직류 마그네트론 스퍼터 코팅원에 의한 저온 다결정 실리콘 및 고기능성 박막의 증착을 위한 스퍼터링장치.
310784.
20010920.
대한민국
수상/공훈
1) 2000. 12 성균관대학교 Best Professor Fellowship상 수여
2) 2006. 10 산업기술분야에서 뛰여난 성과로 인한 대통령상 수여
3) 2007. 01 한국공학한림원 회원
4) 2015. 01 태국 챵마이 대학 명에 박사
학술회의논문
(2018)
New vision plasma application for horicultral industry.
The 17th national Horticultural Congress.
태국
(2018)
Crystalline structured ultra thin film synthesis by nano clusters.
PSE2018.
독일
(2018)
Characteristic of hollow cathode discharge PECVD and its utility for barrier coating on polymer foil.
SPPT2018.
체코
(2018)
New horizon of novel plasma and films for next generation flexible devices.
ISPLASMA2018.
일본
(2018)
Direct synthesis of magnetron sputtered nanostructured Cu films with desired properties via plasma chemistry for their efficient antibacterial application.
The 4th IWAPTA workshop.
인도네시아
(2018)
Synthesis of silicon nitride thin film for high permeation barrier performance with RF power variation on hollow cathode RF PECVD.
제54회 한국진공학회 동계정기학술대회.
대한민국
(2018)
New approach for ultra thin TCO film synthesis by nano cluster.
Joint Workshop by SKKU and Kyushu University.
일본
(2017)
RF 파워의 영향에 따른 고품질 단층 실리콘 질화막의 특성 변화.
한국표면공학회 2017년도 추계학술대회 및 STMT2017.
대한민국
(2017)
Nanoclusters deposition via highly conductive ultra thin flexible ITO films by magnetically confined advanced rectangular magnetron discharges.
IWNA 2017.
베트남
(2017)
High conductivity ITO film synthesis by cluster particle deposition in magnetron sputtering.
TACT 2017.
대만
(2017)
Effectiveness of Plasma and Radical Control for Highly Transparent and Wide-bandgap SiNx:H films prepared by RF/Microwave Dual Frequency PECVD.
AEPSE 2017.
대한민국
(2017)
Efficient Barrier Performance of Flexible Silicon Nitride films deposited by Hollow Cathode RF PECVD.
AEPSE 2017.
대한민국
(2017)
Plasma Controlled Antibacterial Nanostructured Coppor Coatings Prepared by pulsed DC Magnetron Sputtering.
AEPSE 2017.
대한민국
(2017)
Ultra-Thin Transparent ITO Films Prepared by Advanced 3D Confined Magnetron Sputtering.
AEPSE 2017.
대한민국
(2017)
Fabrication of carbon thin films for highly conductivity and bio application by control of crystalline-orientation and surface chemistry.
AEPSE 2017.
대한민국
(2017)
High conductivity AZO film synthesis by particle flux control in magnetron sputtering.
ISSP 2017.
일본
(2017)
Rapid synthesis of self assembled Si quantum dots using radical and plasma control in RF/UHF high density plasma at low temperature.
FCSE - 2017.
캐나다
(2017)
Radicals and energy control for Si quantum dot nanostructures.
European Materials Research Society (E-MRS) Spring Meeting 2017.
프랑스
(2017)
Characterazation and study of SiNx barrier films deposited by multi hole hollow cathode RF PECVD.
The 22nd Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics and The 9th Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials.
대한민국
(2017)
Control of film microstructure of ITO film by magnetron sputtering with 3D confined magnetic field.
The 22nd Korea-Japan Workshop on Advanced Plasma Processes and Diagnostics and The 9th Workshop for NU-SKKU Joint Institute for Plasma-Nano Materials.
대한민국
전시/발표회
(2003)
The 1st International Industrial Plasma Technology Fair(IPTF).
대한민국,
(2002)
대학교수 특허기술 및 기술이전 전시회.
대한민국,
(2001)
대한민국 기술대전(New Technology Iudustry Show).
대한민국,
